Information on stopper process 顯影抑製劑相關資訊:
The addition of stopper for approximately 30 s after development interrupts the development process and leads to a rapid rinsing of residual developer.
Due the processing regime however, constantly developer is transferred into the stopper bath. Already small amounts of the developer will affect the efficiency of the stopping process. It is thus highly recommended to constantly exchange the stopper or to use two stopper baths which are arranged consecutively.
If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.
If the stopper AR 600-60 is used for developers AR-P 630-670, higher contrast values up to 10 are possible, while the sensitivity of the PMMA resists is at the same time decreased. Higher exposure doses and prolonged development times are thus required in this case.
規律的製程會使顯影液不斷的被帶入抑制槽, 少量的顯影液就會降低抑制效果. 建議經常性的更換槽液, 或者使用雙抑制槽的設計.
在AR 600-50, AR 600-55及AR 600-56等顯影液加入20%的AR 600-60 stopper可降低顯影速率.
AR 600-60 stopper用於AR-P 630-670 PMMA EBL resist, 可使對比提高到10;但同時也會降低敏感度. 這種情況下,建議提高曝光劑量及延長顯影時間.