Positive E-Beam Resist AR-P 6200series (CSAR 62)
High resolution high contrast EBL resists for integrated circuit & masksProcess conditions
This diagram shows exemplary process steps for AR-P 6200 resists. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing, 👉 “Detailed instructions for optimum processing of e-beam resists”. For recommendations on wastewater treatment and general safety instructions, 👉 ”General product information on Allresist e-beam resists”.
圖示AR-P 6200.09產品製程參數的範例. 所有參數為參考值,使用者應依設備環境實際狀況加以調整
▶️ Product data 產品資料
▶️ Structure & resolution 結構與解析度
▶️ Process baseline 製程參數
Product quick guide 產品快速導覽▶️ EBL resist 電子束微影阻劑▶️ tSPL resist 熱掃描微影阻劑▶️ Conductive coating 導電塗佈▶️ Photoresist 光阻劑▶️ Protective resist 保護塗層▶️ Bottom resist 底層阻劑▶️ Process chemicals 製程化學品