Positive Photoresists AR-P 5300series for lift-off
Sensitive photoresist for the production of evaporation samples
AR-P 5300series 產品說明
AR-P 5300系列產品為高敏感度正型光阻,適合電極等金屬蒸鍍浮剝離(lift-off)製程
產品編號:
AR-P 5320 /AR-P 5350
產品包裝:
產品無固定生產排程,購買需先詢問
250 ml/瓶
1,000 ml/瓶
出貨: ☑️ 4 – 8 週. 徳國運出
🔲 1 週. 國內庫存
Characterization 產品特性
broadband UV, i-line, g-line
曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)
high photosensitivity, high resolution
高敏感度,高解析度
good adhesion properties
與基板介面接著度良好
undercut structures for the production of evaporation samples, in particular of metal using lift-off techniques e.g., for conductor paths
下切結構適合金屬電極等蒸鍍及浮剝離技術
plasma etching resistant, temperature-stable up to 120 °C
耐電漿蝕刻,耐溫可達120℃
combination of novolac and naphthoquinone diazide
主要成份為酚醛樹酯及叠氮基萘醌
safer solvent PGMEA
使用較安全溶劑丙二醇單甲醚醋酸酯