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  • Product and Service
    • EBL resist電子束微影
      • AR-P 630-670 PMMA resist
      • AR-P 617 copolymer
      • AR-P 6200 copolymer
      • AR-P 6510 thick resist
      • AR-N 7500 non-CAR
      • AR-N 7520new non-CAR
      • AR-N 7520 non-CAR
      • AR-N 7700 CAR-type
      • AR-N 7720 CAR type
      • SX AR-N 8200 HSQ-like
      • SX AR-N 8250 HSQ-like
    • tSPL resist 熱掃描探針微影
      • PPA & AR-P 8100
    • Conductive coating導電層
      • AR-PC 5090.02
      • AR-PC 5091.02
      • AR-PC 5092.02
    • Photoresist光阻
      • AR-P 1200 spray resist
      • AR-P 3100 adhesion enhanced
      • AR-P 3200 thick PR
      • AR-P 3500(T) std PR
      • AR-P 3740 std PR
      • AR-P 5300 for lift-off
      • SX AR-P 3500/8 high temp
      • AR-N 2200 spray PR
      • AR-N 4340 CAR type
      • AR-N 4400 thick PR
      • AR-N 4650-10 thick PR for plating
      • AR-N 4600-10 thick permanent film
    • Protective resist蝕刻保護塗層
      • AR-PC 504 KOH-resistant resist
      • AR-PC 5040 KOH-resistant resist
      • SX AR-PC 5000/41 HF & KOH resistant
    • Bottom resist底層阻劑
      • AR-BR 5400 multi-layer lift-off
    • Process chemicals製程化學品
      • Adhesion promoter增黏劑
        • AR 300-80 new adhesion promoter
      • Developer 顯影劑
        • AR 300-26 buffered developer
        • AR 300-35 buffered developer
        • AR 300-44 MIF developer
        • AR 300-46 MIF developer
        • AR 300-47 MIF developer
        • AR 300-475 MIF developer
        • AR 600-50 ultra pure
        • AR 600-51 ultra pure
        • AR 600-55 ultra pure
        • AR 600-56 ultra pure
        • AR 600-57 MIBK-free for PMMA
        • AR 600-546 for CSAR 62 weaker
        • AR 600-548 for CSAR 62 stronger
        • AR 600-549 for CSAR 62 moderate
        • X AR 600-50/2 multi-layer app
      • Remover 去除劑
        • AR 300-70 organic solvent
        • AR 300-72 organic solvent
        • AR 300-73 aqueous-alkaline
        • AR 300-76 organic solvent
        • AR 600-71 organic solvent
      • Stopper顯影抑制劑
        • AR 600-60
        • X AR 600-61
      • Thinner 稀釋劑
        • AR 300-12
        • AR 600-02
        • AR 600-07
        • AR 600-09
        • X AR 300-74/1
 
  • Home
  • Product and Service
    • EBL resist電子束微影
      • AR-P 630-670 PMMA resist
      • AR-P 617 copolymer
      • AR-P 6200 copolymer
      • AR-P 6510 thick resist
      • AR-N 7500 non-CAR
      • AR-N 7520new non-CAR
      • AR-N 7520 non-CAR
      • AR-N 7700 CAR-type
      • AR-N 7720 CAR type
      • SX AR-N 8200 HSQ-like
      • SX AR-N 8250 HSQ-like
    • tSPL resist 熱掃描探針微影
      • PPA & AR-P 8100
    • Conductive coating導電層
      • AR-PC 5090.02
      • AR-PC 5091.02
      • AR-PC 5092.02
    • Photoresist光阻
      • AR-P 1200 spray resist
      • AR-P 3100 adhesion enhanced
      • AR-P 3200 thick PR
      • AR-P 3500(T) std PR
      • AR-P 3740 std PR
      • AR-P 5300 for lift-off
      • SX AR-P 3500/8 high temp
      • AR-N 2200 spray PR
      • AR-N 4340 CAR type
      • AR-N 4400 thick PR
      • AR-N 4650-10 thick PR for plating
      • AR-N 4600-10 thick permanent film
    • Protective resist蝕刻保護塗層
      • AR-PC 504 KOH-resistant resist
      • AR-PC 5040 KOH-resistant resist
      • SX AR-PC 5000/41 HF & KOH resistant
    • Bottom resist底層阻劑
      • AR-BR 5400 multi-layer lift-off
    • Process chemicals製程化學品
      • Adhesion promoter增黏劑
        • AR 300-80 new adhesion promoter
      • Developer 顯影劑
        • AR 300-26 buffered developer
        • AR 300-35 buffered developer
        • AR 300-44 MIF developer
        • AR 300-46 MIF developer
        • AR 300-47 MIF developer
        • AR 300-475 MIF developer
        • AR 600-50 ultra pure
        • AR 600-51 ultra pure
        • AR 600-55 ultra pure
        • AR 600-56 ultra pure
        • AR 600-57 MIBK-free for PMMA
        • AR 600-546 for CSAR 62 weaker
        • AR 600-548 for CSAR 62 stronger
        • AR 600-549 for CSAR 62 moderate
        • X AR 600-50/2 multi-layer app
      • Remover 去除劑
        • AR 300-70 organic solvent
        • AR 300-72 organic solvent
        • AR 300-73 aqueous-alkaline
        • AR 300-76 organic solvent
        • AR 600-71 organic solvent
      • Stopper顯影抑制劑
        • AR 600-60
        • X AR 600-61
      • Thinner 稀釋劑
        • AR 300-12
        • AR 600-02
        • AR 600-07
        • AR 600-09
        • X AR 300-74/1
  • More
    • Home
    • Product and Service
      • EBL resist電子束微影
        • AR-P 630-670 PMMA resist
        • AR-P 617 copolymer
        • AR-P 6200 copolymer
        • AR-P 6510 thick resist
        • AR-N 7500 non-CAR
        • AR-N 7520new non-CAR
        • AR-N 7520 non-CAR
        • AR-N 7700 CAR-type
        • AR-N 7720 CAR type
        • SX AR-N 8200 HSQ-like
        • SX AR-N 8250 HSQ-like
      • tSPL resist 熱掃描探針微影
        • PPA & AR-P 8100
      • Conductive coating導電層
        • AR-PC 5090.02
        • AR-PC 5091.02
        • AR-PC 5092.02
      • Photoresist光阻
        • AR-P 1200 spray resist
        • AR-P 3100 adhesion enhanced
        • AR-P 3200 thick PR
        • AR-P 3500(T) std PR
        • AR-P 3740 std PR
        • AR-P 5300 for lift-off
        • SX AR-P 3500/8 high temp
        • AR-N 2200 spray PR
        • AR-N 4340 CAR type
        • AR-N 4400 thick PR
        • AR-N 4650-10 thick PR for plating
        • AR-N 4600-10 thick permanent film
      • Protective resist蝕刻保護塗層
        • AR-PC 504 KOH-resistant resist
        • AR-PC 5040 KOH-resistant resist
        • SX AR-PC 5000/41 HF & KOH resistant
      • Bottom resist底層阻劑
        • AR-BR 5400 multi-layer lift-off
      • Process chemicals製程化學品
        • Adhesion promoter增黏劑
          • AR 300-80 new adhesion promoter
        • Developer 顯影劑
          • AR 300-26 buffered developer
          • AR 300-35 buffered developer
          • AR 300-44 MIF developer
          • AR 300-46 MIF developer
          • AR 300-47 MIF developer
          • AR 300-475 MIF developer
          • AR 600-50 ultra pure
          • AR 600-51 ultra pure
          • AR 600-55 ultra pure
          • AR 600-56 ultra pure
          • AR 600-57 MIBK-free for PMMA
          • AR 600-546 for CSAR 62 weaker
          • AR 600-548 for CSAR 62 stronger
          • AR 600-549 for CSAR 62 moderate
          • X AR 600-50/2 multi-layer app
        • Remover 去除劑
          • AR 300-70 organic solvent
          • AR 300-72 organic solvent
          • AR 300-73 aqueous-alkaline
          • AR 300-76 organic solvent
          • AR 600-71 organic solvent
        • Stopper顯影抑制劑
          • AR 600-60
          • X AR 600-61
        • Thinner 稀釋劑
          • AR 300-12
          • AR 600-02
          • AR 600-07
          • AR 600-09
          • X AR 300-74/1

Product quick view 產品快速瀏覽

▶️ EBL resist 電子束微影阻劑

▶️  tSPL resist 熱掃描微影阻劑

▶️  Conductive coating 導電塗佈

▶️  AR-PC 5090.02 (Electra 92)

▶️  AR-PC 5091.02 (Electra 92)

▶️  Photoresist 光阻劑

▶️  Protective resist 保護塗層

▶️  Bottom resist 底層阻劑

▶️  Process chemicals 製程化學品

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Bilingual contents are based on Allresist product technical data內容說明為譯自原廠產品技術資料
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