AR-N 4600 series (Atlas 46) negative photoresist for high film thickness
for the application of electroplating, micro-systems and LIGA < 20 μm
Resist structures
Atlas (S) (Martin Luther University Halle-Wittenberg)
Process parameters
Resist structures
Atlas (R) (Martin Luther University Halle-Wittenberg)
Process chemicals
AR-N 4600series negative CAR photoresist
▶️ resolution & structures 解析度與結構
Product quick guide 產品快速導覽▶️ EBL resist 電子束微影阻劑▶️ tSPL resist 熱掃描微影阻劑▶️ Conductive coating 導電塗佈▶️ Photoresist 光阻劑▶️ Protective resist 保護塗層▶️ Bottom resist 底層阻劑▶️ Process chemicals 製程化學品