Thermostable Positive Photoresist SX AR-P 3500/8

for high-temperature application up to 300 °C

This diagram shows exemplary process steps for SXAR-P 3500/8 resists. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing, 👉“ Detailed instructions for optimum processing of photoresists”. For recommendations on wastewater treatment and general safety instructions, 👉”General product information on Allresist photoresists”.

圖示SXAR-P 3500/8產品製程參數的範例. 所有參數為參考值,使用者應依設備環境實際狀況加以調整