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EBL resist電子束微影
AR-P 630-670 PMMA resist
AR-P 617 copolymer
AR-P 6200 copolymer
AR-P 6510 thick resist
AR-N 7500 non-CAR
AR-N 7520new non-CAR
AR-N 7520 non-CAR
AR-N 7700 CAR-type
AR-N 7720 CAR type
SX AR-N 8200 HSQ-like
SX AR-N 8250 HSQ-like
tSPL resist 熱掃描探針微影
PPA & AR-P 8100
Conductive coating導電層
AR-PC 5090.02
AR-PC 5091.02
AR-PC 5092.02
Photoresist光阻
AR-P 1200 spray resist
AR-P 3100 adhesion enhanced
AR-P 3200 thick PR
AR-P 3500(T) std PR
AR-P 3740 std PR
AR-P 5300 for lift-off
SX AR-P 3500/8 high temp
AR-N 2200 spray PR
AR-N 4340 CAR type
AR-N 4400 thick PR
AR-N 4650-10 thick PR for plating
AR-N 4600-10 thick permanent film
Protective resist蝕刻保護塗層
AR-PC 504 KOH-resistant resist
AR-PC 5040 KOH-resistant resist
SX AR-PC 5000/41 HF & KOH resistant
Bottom resist底層阻劑
AR-BR 5400 multi-layer lift-off
Process chemicals製程化學品
Adhesion promoter增黏劑
AR 300-80 new adhesion promoter
Developer 顯影劑
AR 300-26 buffered developer
AR 300-35 buffered developer
AR 300-44 MIF developer
AR 300-46 MIF developer
AR 300-47 MIF developer
AR 300-475 MIF developer
AR 600-50 ultra pure
AR 600-51 ultra pure
AR 600-55 ultra pure
AR 600-56 ultra pure
AR 600-57 MIBK-free for PMMA
AR 600-546 for CSAR 62 weaker
AR 600-548 for CSAR 62 stronger
AR 600-549 for CSAR 62 moderate
X AR 600-50/2 multi-layer app
Remover 去除劑
AR 300-70 organic solvent
AR 300-72 organic solvent
AR 300-73 aqueous-alkaline
AR 300-76 organic solvent
AR 600-71 organic solvent
Stopper顯影抑制劑
AR 600-60
X AR 600-61
Thinner 稀釋劑
AR 300-12
AR 600-02
AR 600-07
AR 600-09
X AR 300-74/1
Home
Product and Service
EBL resist電子束微影
AR-P 630-670 PMMA resist
AR-P 617 copolymer
AR-P 6200 copolymer
AR-P 6510 thick resist
AR-N 7500 non-CAR
AR-N 7520new non-CAR
AR-N 7520 non-CAR
AR-N 7700 CAR-type
AR-N 7720 CAR type
SX AR-N 8200 HSQ-like
SX AR-N 8250 HSQ-like
tSPL resist 熱掃描探針微影
PPA & AR-P 8100
Conductive coating導電層
AR-PC 5090.02
AR-PC 5091.02
AR-PC 5092.02
Photoresist光阻
AR-P 1200 spray resist
AR-P 3100 adhesion enhanced
AR-P 3200 thick PR
AR-P 3500(T) std PR
AR-P 3740 std PR
AR-P 5300 for lift-off
SX AR-P 3500/8 high temp
AR-N 2200 spray PR
AR-N 4340 CAR type
AR-N 4400 thick PR
AR-N 4650-10 thick PR for plating
AR-N 4600-10 thick permanent film
Protective resist蝕刻保護塗層
AR-PC 504 KOH-resistant resist
AR-PC 5040 KOH-resistant resist
SX AR-PC 5000/41 HF & KOH resistant
Bottom resist底層阻劑
AR-BR 5400 multi-layer lift-off
Process chemicals製程化學品
Adhesion promoter增黏劑
AR 300-80 new adhesion promoter
Developer 顯影劑
AR 300-26 buffered developer
AR 300-35 buffered developer
AR 300-44 MIF developer
AR 300-46 MIF developer
AR 300-47 MIF developer
AR 300-475 MIF developer
AR 600-50 ultra pure
AR 600-51 ultra pure
AR 600-55 ultra pure
AR 600-56 ultra pure
AR 600-57 MIBK-free for PMMA
AR 600-546 for CSAR 62 weaker
AR 600-548 for CSAR 62 stronger
AR 600-549 for CSAR 62 moderate
X AR 600-50/2 multi-layer app
Remover 去除劑
AR 300-70 organic solvent
AR 300-72 organic solvent
AR 300-73 aqueous-alkaline
AR 300-76 organic solvent
AR 600-71 organic solvent
Stopper顯影抑制劑
AR 600-60
X AR 600-61
Thinner 稀釋劑
AR 300-12
AR 600-02
AR 600-07
AR 600-09
X AR 300-74/1
More
Home
Product and Service
EBL resist電子束微影
AR-P 630-670 PMMA resist
AR-P 617 copolymer
AR-P 6200 copolymer
AR-P 6510 thick resist
AR-N 7500 non-CAR
AR-N 7520new non-CAR
AR-N 7520 non-CAR
AR-N 7700 CAR-type
AR-N 7720 CAR type
SX AR-N 8200 HSQ-like
SX AR-N 8250 HSQ-like
tSPL resist 熱掃描探針微影
PPA & AR-P 8100
Conductive coating導電層
AR-PC 5090.02
AR-PC 5091.02
AR-PC 5092.02
Photoresist光阻
AR-P 1200 spray resist
AR-P 3100 adhesion enhanced
AR-P 3200 thick PR
AR-P 3500(T) std PR
AR-P 3740 std PR
AR-P 5300 for lift-off
SX AR-P 3500/8 high temp
AR-N 2200 spray PR
AR-N 4340 CAR type
AR-N 4400 thick PR
AR-N 4650-10 thick PR for plating
AR-N 4600-10 thick permanent film
Protective resist蝕刻保護塗層
AR-PC 504 KOH-resistant resist
AR-PC 5040 KOH-resistant resist
SX AR-PC 5000/41 HF & KOH resistant
Bottom resist底層阻劑
AR-BR 5400 multi-layer lift-off
Process chemicals製程化學品
Adhesion promoter增黏劑
AR 300-80 new adhesion promoter
Developer 顯影劑
AR 300-26 buffered developer
AR 300-35 buffered developer
AR 300-44 MIF developer
AR 300-46 MIF developer
AR 300-47 MIF developer
AR 300-475 MIF developer
AR 600-50 ultra pure
AR 600-51 ultra pure
AR 600-55 ultra pure
AR 600-56 ultra pure
AR 600-57 MIBK-free for PMMA
AR 600-546 for CSAR 62 weaker
AR 600-548 for CSAR 62 stronger
AR 600-549 for CSAR 62 moderate
X AR 600-50/2 multi-layer app
Remover 去除劑
AR 300-70 organic solvent
AR 300-72 organic solvent
AR 300-73 aqueous-alkaline
AR 300-76 organic solvent
AR 600-71 organic solvent
Stopper顯影抑制劑
AR 600-60
X AR 600-61
Thinner 稀釋劑
AR 300-12
AR 600-02
AR 600-07
AR 600-09
X AR 300-74/1
Epitaxial Layer lift-off & Transfer Technology
For the application of compound semiconductor
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