Thick Positive Photoresists AR-P 3200series

For the application of electroplating and micro-systems technology

AR-P 3200series 產品說明

AR-P 3200 系列產品為正型厚膜光阻,適合電鍍與微機電系統製程.

產品編號:

AR-P 3210 / AR-P 3220 / AR-P 3250 / AR-P 3250T

產品包裝:

產品無固定生產週期,需事先詢問.

250 ml/ /瓶

1,000 ml/ /瓶

出貨: ☑️ 4 - 8 週. 徳國運出

🔲 1 週. 國內庫存

Characterization 產品特性

  • broadband UV, i-line, g-line

曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)

  • high photosensitivity, high resolution

高敏感度,高解析度

  • profiles with high edge steepness dimension accuracy.

黃光圖案尺寸精確,邊緣垂直度高

  • plasma etch resistant, electroplating-stable

耐電漿蝕刻. 電鍍製程穩定

  • AR-P 3210 film thickness up to 40um/AR-P 3250 film thicknesses up to 20 μm

AR-P 3210 膜厚最高可達 40um/AR-P 3250膜厚最高可達20um

  • AR-P 3220 transparent for thick films up to 100 μm in multiple coating steps, 100μm development in one step

AR-P 3220 透明膜厚經多次疊加塗佈可達100um,僅需單次顯影.

  • combination of novolac and naphthoquinone diazide

主要成份為酚醛樹酯及叠氮基萘醌

  • safer solvent PGMEA

使用較安全溶劑丙二醇單甲醚醋酸酯