Stopper for AR Resist

For the stopping of e-beam resist film development with solvents

Stopper Product Brief 產品說明

顯影抑制劑主要用於電子束微影的顯影製程,可使顯影製程中斷.目前產品有:

AR 600-60 / AR 600-61

AR 600-60 適用於AR-P 617 series / AR-P 6200 series / AR-P 630-670 PMMA

AR 600-61適用於 AR-P 6510 EBL resist


AR stopper 產品包裝:

2.5 L /瓶

其它包裝可依客戶需求增加.

出貨: ☑️ 2 - 4 週. 徳國運出

🔲 1 週. 國內庫存



Characterization 產品特性

  • immediate interruption of the development process

可立即中斷顯影製程

  • ultra-pure solvent mixtures for residue-free removal of remaining developer

高純度混合溶劑,可有效的去除殘留的顯影液

  • If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.

於顯影液AR 600-50 / AR 600-55 / AR 600-56中加入20%的AR 600-60抑制劑,可降

低顯影速率.


Information on stopper process 顯影抑製劑相關資訊:

The addition of stopper for approximately 30 s after development interrupts the development process and leads to a rapid rinsing of residual developer.

Due the processing regime however, constantly developer is transferred into the stopper bath. Already small amounts of the developer will affect the efficiency of the stopping process. It is thus highly recommended to constantly exchange the stopper or to use two stopper baths which are arranged consecutively.

If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.

If the stopper AR 600-60 is used for developers AR-P 630-670, higher contrast values up to 10 are possible, while the sensitivity of the PMMA resists is at the same time decreased. Higher exposure doses and prolonged development times are thus required in this case.


加入抑制劑約30秒後, 會中斷顯影且導致快速增加的顯影液殘留.

規律的製程會使顯影液不斷的被帶入抑制槽, 少量的顯影液就會降低抑制效果. 建議經常性的更換槽液, 或者使用雙抑制槽的設計.

在AR 600-50, AR 600-55及AR 600-56等顯影液加入20%的AR 600-60 stopper可降低顯影速率.

AR 600-60 stopper用於AR-P 630-670 PMMA EBL resist, 可使對比提高到10;但同時也會降低敏感度. 這種情況下,建議提高曝光劑量及延長顯影時間.