Standard Positive Photoresists AR-P 3740 for sub-um

Sensitive photoresist for the production of highly integrated circuits

AR-P 3740 產品說明

AR-P 3740 產品為高敏感度正型光阻,適合次微米高密度積體電路製程

產品編號:

AR-P 3740

產品包裝:

250 ml/瓶

1,000 ml/瓶

出貨: ☑️ 2 - 4 週. 徳國運出

🔲 1 週. 國內庫存

Characterization 產品特性

  • broadband UV, i-line, g-line

曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)

  • high sensitivity, highest resolution up to 0.4 μm

高敏感度,最高解析度可達0.4 um

  • high contrast, excellent dimensional accuracy

高對比,尺寸精確度良好

  • optimized coating properties on topologically complex substrate surfaces

塗佈特性適合基板表面複雜的高低結構

  • 3840 colored to prevent the effect of standing waves

AR-P 3840染料參雜以避免駐波效應

  • plasma etching resistant, temperature-stable up to 120 °C

耐電漿蝕刻,耐溫可達120℃

  • combination of novolac and naphthoquinone diazide

主要成份為酚醛樹酯及叠氮基萘醌

  • safer solvent PGMEA

使用較安全溶劑丙二醇單甲醚醋酸酯