Positive E-Beam Resist AR-P 6200series (CSAR 62)

High resolution high contrast EBL resists for integrated circuit & masks

Application examples for AR-P 6200 series (CSAR 62)

Circuits for the 5 GHz range which are primarily needed for wireless Bluetooth or Wi-Fi technologies can in future be produced with CSAR 62. E-beam lithography is also required for the research on nanomaterials like graphene, for three-dimensional integrated circuits as well as for op- tical and quantum computers. The computing power or memory density is constantly increased in each of these technologies. Applications with the highest demands on computing power (supercomputers), e.g. in computational fluid dynamics or in space applications, thus also demand microchips with highest integration density.

CSAR 62電子束微影應用範圍廣汎,例如未來5G的無線通訊電路製作,石墨烯等奈米材料的研發, 3D積體電路,光學及量子電腦等等. 這些科技的運算速度及記憶體密度不斷增加. 需要高速運算的應用, 例如計算流體力學,或太空科技的超級電腦都需要高速運算及高密度晶片.