Positive Photoresists AR-P 3100 series

Adhesion-enhanced resists for masks and fine scale application

AR-P 3100series 產品說明

AR-P 3100 系列產品強化與基板介面的接著度,適合各類精密微影

產品編號:

AR-P 3110 / AR-P 3120 / AR-P 3170

產品包裝:

250 ml/ /瓶

1,000 ml/ /瓶

出貨: ☑️ 2 - 4 週. 徳國運出

🔲 1 週. 國內庫存

Characterization 產品特性

  • broadband UV, i-line, g-line

曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)

  • high photosensitivity, high resolution

高敏感度,高解析度

  • strong adhesion to critical glass/chromium surfaces for extreme stresses during wet-chemical etching processes

對玻璃,鉻等介面接著度良好,適合濕蝕刻製程

  • for the production of CD masters and lattice structures

適合CD母片及各式點陣結構

  • AR-P 3170 also suitable for laser interference lithography

AR-P 3170可用於雷射干涉微影

  • plasma etching resistant

耐電漿蝕刻

  • combination of novolac and naphthoquinone diazide

主要成份為酚醛樹酯及叠氮基萘醌

  • safer solvent PGMEA

使用較安全溶劑丙二醇單甲醚醋酸酯