Negative thick layer photoresist AR-N 4400 series (CAR 44)

For the application of electroplating, micro-system and LIGA

AR-N 4400系列產品說明

AR-N 4400系列(CAR 44)為高膜厚光阻,適合電鍍,微系統,微機電等各類應用.

產品編號:

AR-N 4400-05 膜厚: 5 - 10 um@1000-250rpm

AR-N 4400-10 膜厚: 10 - 20 um@1000-250rpm

AR-N 4450-10T膜厚: 10 - 20 um@1000-250rpm

AR-N 4400-25 膜厚: 25 - 50 um@1000-250rpm

AR-N 4400-50 膜厚: 50 - 100 um@1000-250rpm

產品包裝:

250 ml/瓶

1,000 ml/瓶

產品出貨:

☑️ 2 - 4 週. 德國運出

🔲 1 週. 國內庫存

Characterization 產品特性

  • broadband UV, i-line, g-line, e-beam, X-ray, synchrotron

適合各類曝光;寬頻紫外線, i-line, g-line, 電子束,x光,同步輻射

  • chemically enhanced, very good adhesion, electro plating-stable

化學放大型光阻. 與基板介面接著性良好. 於電鍍製程穩定

  • very high sensitivity, easy removal

光阻具高敏感度,且去除容易

  • profiles with high edge steepness for excellent resolution, covering of topologies

光阻圖案側視具垂直邊緣,解析度高

  • 4400-05 for film thicknesses up to 10 μm (250 rpm)

4400-05膜厚在250轉可達10um

  • 4400-10 for film thicknesses up to 20 μm (250 rpm)

4400-10膜厚在250轉可達20um

  • 4450-10T for film thicknesses up to 20 μm and lift-off, developing by TMAH 0.26n

4450-10T膜厚在250轉可達20um,適lift-off及TMAH (0.26n)顯影

  • 4400-25 for very thick film up to 50um (250 rpm)

4400-25膜厚在250轉可達50um

  • 4400-50 for highest film thickness up to 100 um

4400-50膜厚可達100um

  • novolac, crosslinking agent, amine-based acid generator

成份含酚醛樹脂,架橋劑,胺基光酸.

  • safer solvent PGMEA

較安全溶劑丙二醇單甲醚醋酸酯PGMEA