Chemically Amplified Negative Photoresist AR-N 4340

Highly sensitive negative resist for the production of integrated circuits

This diagram shows exemplary process steps for resist AR-N 4340. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing, 👉“Detailed instructions for optimum processing of photoresists”. For recommendations on wastewater treatment and general safety instructions, 👉”General product information on Allresist photoresists”.