Thermostable Positive Photoresist SX AR-P 3500/8

for high-temperature application up to 300 °C

SXAR-P 3500/8 產品說明

SXAR-P 3500/8產品為耐高溫正型光阻,耐溫可達300℃,適合各類高溫製程

產品編號:

SXAR-P 3500/8

產品包裝:

SXAR-P 3500/8 為實驗中產品,可依客戶需求訂製,購買請先詢問

250 ml/瓶

1,000 ml/瓶

出貨: ☑️ 4 – 8 週. 徳國運出

🔲 1 週. 國內庫存

Characterization 產品特性

  • broadband UV, i-line, g-line

曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)

  • high plasma etching resistant, thermal stable up to 300 °C

耐電漿蝕刻,耐溫可達300℃

  • suitable for high-temperature 2-layer lift-off processes as well as plasma etching and implantation processes

適合高溫製程,例如: 雙層浮剝離電漿蝕刻, 植入等

  • combination of poly(hydroxystyrene-co-MMA) and naphthoquinone diazide

主要成份為高分子共聚物(羥基苯乙烯-co-甲基丙烯酸甲酯)及叠氮基萘醌

  • safer solvent PGMEA

使用較安全溶劑丙二醇單甲醚醋酸酯