Chemically Amplified Negative Photoresist AR-N 4340
Highly sensitive negative resist for the production of integrated circuits
Structure resolution
Process parameter
Resist structures
Process chemicals
AR-N 4340 negative CAR photoresist
▶️ resolution & structures 解析度與結構
Product quick guide 產品快速導覽▶️ EBL resist 電子束微影阻劑▶️ tSPL resist 熱掃描微影阻劑▶️ Conductive coating 導電塗佈▶️ Photoresist 光阻劑▶️ Protective resist 保護塗層▶️ Bottom resist 底層阻劑▶️ Process chemicals 製程化學品