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Semiconductor Materials
EBL resist電子束微影
Copolymer AR-P 617
AR-P 617 brief
AR-P 617 features
AR-P 617 Properties I and II
AR-P 617 spin curve
AR-P 617 process baseline
AR-P 617 th co-relation
AR-P 617 structure and resolution
AR-P 617 liftoff process
AR-P 617 reaction mechanism
AR-P 617 Planarization
Copolymer AR-P 6200(CSAR 62)
6200 brief簡介
6200 Product data
6200 Features
6200 properties
6200 Spin Curve
6200 Structure & Resolution
6200 Process Baseline
6200 Etching Rate
6200 process recipe
6200 fine tune basic
6200 ebeam exposure
6200 development
6200 lift-off structure
6200 high layer & others
6200 Application example
App general
6200 Mask blanks
6200 HR litho
6200 2-layer lift-off
6200 square structure
6200 dev at lower temp
6200 written at 100kV
6200 dev for T-gate
6200 Fluorescent film
PMMA EBL resist
PMMA resist brief
PMMA resist features
PMMA resist properties
PMMA resist spin curve
PMMA structure resolution
PMMA Process Baseline
PMMA 2-layer lift-off
PMMA Reaction Mechanism
PMMA application example
PMMA specification table
HSQ compatible resist
SX AR-N 8200 (Medusa 82)
8200 brief
8200 features
8200 properties
8200 spin curve
8200 structure&resolution
8200 process baseline
8200 process tuning
SX AR-N 8250 (Medusa 82 UV)
8250 brief
8250 features
8250 properties
8250 spin curve
8250 structure&resolution
8250 process baseline
8250 process tuning
AR-N 7500 nega EBL resist
7500 brief
7500 features
7500 properties
7500 spin curve
7500 resolution&structure
7500 process baseline
AR-N 7520 nega EBL resist
7520 brief
7520 features
7520 properties
7520 spin curve
7520 structure&resolution
7520 process baseline
AR-N 7520 new nega EBL resist
7520new brief
7520new features
7520new properties
7520new spin curve
7520new structure&resolution
7520new process baseline
AR-N 7700 nega EBL resist
AR-N 7700 brief
AR-N 7700 features
AR-N 7700 properties
AR-N 7700 spin curve
AR-N 7700 structure&resolution
AR-N 7700 process baseline
AR-N 7700 proximity effect
AR-N 7720 nega EBL resist
7720 brief
7720 features
7720 properties
7720 spin curve
7720 structure&resolution
7720 process baseline
7720 3D structures
tSPL resist 熱掃描探針微影
tSPL resist brief 簡介
8100 resist-brief
PPA polymer
PPA solution preparation
AR-P 8100 data 產品資料
8100 features
8100 properties
8100 spin curve
8100 resolution&structure
8100 process baseline
8100 2-layer process
AR-P 8100 app example
8100 patterned with EBL
8100 patterned with photolitho
8100 patterned with laser
Conductive coating導電層
AR-PC 5090.02(Electra 92)
5090.02 features
5090.02 properties
5090.02 conductivity
5090.02 dissipation of charges
5090.02 process baseline
5090.02 application vs EBL resist
AR-PC 5091.02 (Electra 92)
5091.02 features
5091.02 properties
5091.02 conductivity
5091.02 dissipation of charge
5091.02 process baseline
5091.02 AR-N 7700 on glass
Photoresist光阻
AR-P 1200 spray PR
1200 properties
1200 spray coater parameters
1200 process baseline
AR-P 3100series posi PR
3100 properties
3100 spin curve
3100 structure&resolution
3100 process baseline
3100 data for fine tune
AR-P 3200series thick PR
3200 properties
3200 spin curve
3200 structure&resolution
3200 process baseline
3200 data for fine tune
AR-P 3500series posi PR
3500 properties
3500 spin curve
3500 structure
3500 process baseline
3500 data for fine tune
AR-P 3740 posi PR
3740 properties
3740 spin curve
3740 structure&resolution
3740 process baseline
3740 data for fine tune
AR-P 5300series posi PR
5300 properties
5300 spin curve
5300 structure&resolution
5300 process baseline
SXAR-P 3500/8 posi PR
3500/8 properties
3500/8 spin curve
3500/8 structure&resolution
3500/8 process baseline
AR-N 2200series spray PR
2200 properties
2200 spray coater parameters
2200 process baseline
AR-N 4340 CAR
4340 properties
4340 spin curve
4340 resolution&structure
4340 process baseline
4340 data for fine tune
AR-N 4400series (CAR 44)
4400 properties
4400 spin curve
4400 structure & resolution
4400 process baseline
4400 data for fine tine
4400 thick layer
4400 rival comparison
AR-N 4600 series (Atlas 46)
4600 properties
4600 spin curve
4600 resist structures
4600 process baseline
4600 data for fine tune
4600 Dyed and fluorescent films
Protective resist保護阻劑
AR-PC 500series
500 properties
500 spin curve
500 application photo
500 process baseline
SX AR-PC 5000/41
5000/41 properties
5000/41 spin curve
5000/41 application photo
5000/41 1-layer process baseline
5000/41 2-layer process baseline
Bottom resist底層阻劑
AR-BR 5400series
5400 properties
5400 spin curve
5400 structure&resolution
5400 2-layer posi-PR process
5400 2-layer nega-PR process」的複本
Process chemicals製程化學品
Developer 顯影劑
AR 300-26
AR 300-35
AR 300-44
AR 300-46
AR 300-47
AR 300-475
AR 600-50
AR 600-546
AR 600-548
AR 600-549
AR 600-55
AR 600-56
Remover 去除劑
AR 300-70
AR 300-72
AR 300-73
AR 300-76
AR 600-71
Adhesion promoter增黏劑
AR 300-80
HMDS
Thinner 稀釋劑
AR 300-12
AR 600-02
AR 600-07
AR 600-09
Stopper顯影抑制劑
AR 600-60
Equipments
ELO-Epitaxial lift-off
Contact us 聯絡我們
Contact Us
Resist Wiki
Techpoint
Home
Semiconductor Materials
EBL resist電子束微影
Copolymer AR-P 617
AR-P 617 brief
AR-P 617 features
AR-P 617 Properties I and II
AR-P 617 spin curve
AR-P 617 process baseline
AR-P 617 th co-relation
AR-P 617 structure and resolution
AR-P 617 liftoff process
AR-P 617 reaction mechanism
AR-P 617 Planarization
Copolymer AR-P 6200(CSAR 62)
6200 brief簡介
6200 Product data
6200 Features
6200 properties
6200 Spin Curve
6200 Structure & Resolution
6200 Process Baseline
6200 Etching Rate
6200 process recipe
6200 fine tune basic
6200 ebeam exposure
6200 development
6200 lift-off structure
6200 high layer & others
6200 Application example
App general
6200 Mask blanks
6200 HR litho
6200 2-layer lift-off
6200 square structure
6200 dev at lower temp
6200 written at 100kV
6200 dev for T-gate
6200 Fluorescent film
PMMA EBL resist
PMMA resist brief
PMMA resist features
PMMA resist properties
PMMA resist spin curve
PMMA structure resolution
PMMA Process Baseline
PMMA 2-layer lift-off
PMMA Reaction Mechanism
PMMA application example
PMMA specification table
HSQ compatible resist
SX AR-N 8200 (Medusa 82)
8200 brief
8200 features
8200 properties
8200 spin curve
8200 structure&resolution
8200 process baseline
8200 process tuning
SX AR-N 8250 (Medusa 82 UV)
8250 brief
8250 features
8250 properties
8250 spin curve
8250 structure&resolution
8250 process baseline
8250 process tuning
AR-N 7500 nega EBL resist
7500 brief
7500 features
7500 properties
7500 spin curve
7500 resolution&structure
7500 process baseline
AR-N 7520 nega EBL resist
7520 brief
7520 features
7520 properties
7520 spin curve
7520 structure&resolution
7520 process baseline
AR-N 7520 new nega EBL resist
7520new brief
7520new features
7520new properties
7520new spin curve
7520new structure&resolution
7520new process baseline
AR-N 7700 nega EBL resist
AR-N 7700 brief
AR-N 7700 features
AR-N 7700 properties
AR-N 7700 spin curve
AR-N 7700 structure&resolution
AR-N 7700 process baseline
AR-N 7700 proximity effect
AR-N 7720 nega EBL resist
7720 brief
7720 features
7720 properties
7720 spin curve
7720 structure&resolution
7720 process baseline
7720 3D structures
tSPL resist 熱掃描探針微影
tSPL resist brief 簡介
8100 resist-brief
PPA polymer
PPA solution preparation
AR-P 8100 data 產品資料
8100 features
8100 properties
8100 spin curve
8100 resolution&structure
8100 process baseline
8100 2-layer process
AR-P 8100 app example
8100 patterned with EBL
8100 patterned with photolitho
8100 patterned with laser
Conductive coating導電層
AR-PC 5090.02(Electra 92)
5090.02 features
5090.02 properties
5090.02 conductivity
5090.02 dissipation of charges
5090.02 process baseline
5090.02 application vs EBL resist
AR-PC 5091.02 (Electra 92)
5091.02 features
5091.02 properties
5091.02 conductivity
5091.02 dissipation of charge
5091.02 process baseline
5091.02 AR-N 7700 on glass
Photoresist光阻
AR-P 1200 spray PR
1200 properties
1200 spray coater parameters
1200 process baseline
AR-P 3100series posi PR
3100 properties
3100 spin curve
3100 structure&resolution
3100 process baseline
3100 data for fine tune
AR-P 3200series thick PR
3200 properties
3200 spin curve
3200 structure&resolution
3200 process baseline
3200 data for fine tune
AR-P 3500series posi PR
3500 properties
3500 spin curve
3500 structure
3500 process baseline
3500 data for fine tune
AR-P 3740 posi PR
3740 properties
3740 spin curve
3740 structure&resolution
3740 process baseline
3740 data for fine tune
AR-P 5300series posi PR
5300 properties
5300 spin curve
5300 structure&resolution
5300 process baseline
SXAR-P 3500/8 posi PR
3500/8 properties
3500/8 spin curve
3500/8 structure&resolution
3500/8 process baseline
AR-N 2200series spray PR
2200 properties
2200 spray coater parameters
2200 process baseline
AR-N 4340 CAR
4340 properties
4340 spin curve
4340 resolution&structure
4340 process baseline
4340 data for fine tune
AR-N 4400series (CAR 44)
4400 properties
4400 spin curve
4400 structure & resolution
4400 process baseline
4400 data for fine tine
4400 thick layer
4400 rival comparison
AR-N 4600 series (Atlas 46)
4600 properties
4600 spin curve
4600 resist structures
4600 process baseline
4600 data for fine tune
4600 Dyed and fluorescent films
Protective resist保護阻劑
AR-PC 500series
500 properties
500 spin curve
500 application photo
500 process baseline
SX AR-PC 5000/41
5000/41 properties
5000/41 spin curve
5000/41 application photo
5000/41 1-layer process baseline
5000/41 2-layer process baseline
Bottom resist底層阻劑
AR-BR 5400series
5400 properties
5400 spin curve
5400 structure&resolution
5400 2-layer posi-PR process
5400 2-layer nega-PR process」的複本
Process chemicals製程化學品
Developer 顯影劑
AR 300-26
AR 300-35
AR 300-44
AR 300-46
AR 300-47
AR 300-475
AR 600-50
AR 600-546
AR 600-548
AR 600-549
AR 600-55
AR 600-56
Remover 去除劑
AR 300-70
AR 300-72
AR 300-73
AR 300-76
AR 600-71
Adhesion promoter增黏劑
AR 300-80
HMDS
Thinner 稀釋劑
AR 300-12
AR 600-02
AR 600-07
AR 600-09
Stopper顯影抑制劑
AR 600-60
Equipments
ELO-Epitaxial lift-off
Contact us 聯絡我們
Contact Us
Resist Wiki
More
Home
Semiconductor Materials
EBL resist電子束微影
Copolymer AR-P 617
AR-P 617 brief
AR-P 617 features
AR-P 617 Properties I and II
AR-P 617 spin curve
AR-P 617 process baseline
AR-P 617 th co-relation
AR-P 617 structure and resolution
AR-P 617 liftoff process
AR-P 617 reaction mechanism
AR-P 617 Planarization
Copolymer AR-P 6200(CSAR 62)
6200 brief簡介
6200 Product data
6200 Features
6200 properties
6200 Spin Curve
6200 Structure & Resolution
6200 Process Baseline
6200 Etching Rate
6200 process recipe
6200 fine tune basic
6200 ebeam exposure
6200 development
6200 lift-off structure
6200 high layer & others
6200 Application example
App general
6200 Mask blanks
6200 HR litho
6200 2-layer lift-off
6200 square structure
6200 dev at lower temp
6200 written at 100kV
6200 dev for T-gate
6200 Fluorescent film
PMMA EBL resist
PMMA resist brief
PMMA resist features
PMMA resist properties
PMMA resist spin curve
PMMA structure resolution
PMMA Process Baseline
PMMA 2-layer lift-off
PMMA Reaction Mechanism
PMMA application example
PMMA specification table
HSQ compatible resist
SX AR-N 8200 (Medusa 82)
8200 brief
8200 features
8200 properties
8200 spin curve
8200 structure&resolution
8200 process baseline
8200 process tuning
SX AR-N 8250 (Medusa 82 UV)
8250 brief
8250 features
8250 properties
8250 spin curve
8250 structure&resolution
8250 process baseline
8250 process tuning
AR-N 7500 nega EBL resist
7500 brief
7500 features
7500 properties
7500 spin curve
7500 resolution&structure
7500 process baseline
AR-N 7520 nega EBL resist
7520 brief
7520 features
7520 properties
7520 spin curve
7520 structure&resolution
7520 process baseline
AR-N 7520 new nega EBL resist
7520new brief
7520new features
7520new properties
7520new spin curve
7520new structure&resolution
7520new process baseline
AR-N 7700 nega EBL resist
AR-N 7700 brief
AR-N 7700 features
AR-N 7700 properties
AR-N 7700 spin curve
AR-N 7700 structure&resolution
AR-N 7700 process baseline
AR-N 7700 proximity effect
AR-N 7720 nega EBL resist
7720 brief
7720 features
7720 properties
7720 spin curve
7720 structure&resolution
7720 process baseline
7720 3D structures
tSPL resist 熱掃描探針微影
tSPL resist brief 簡介
8100 resist-brief
PPA polymer
PPA solution preparation
AR-P 8100 data 產品資料
8100 features
8100 properties
8100 spin curve
8100 resolution&structure
8100 process baseline
8100 2-layer process
AR-P 8100 app example
8100 patterned with EBL
8100 patterned with photolitho
8100 patterned with laser
Conductive coating導電層
AR-PC 5090.02(Electra 92)
5090.02 features
5090.02 properties
5090.02 conductivity
5090.02 dissipation of charges
5090.02 process baseline
5090.02 application vs EBL resist
AR-PC 5091.02 (Electra 92)
5091.02 features
5091.02 properties
5091.02 conductivity
5091.02 dissipation of charge
5091.02 process baseline
5091.02 AR-N 7700 on glass
Photoresist光阻
AR-P 1200 spray PR
1200 properties
1200 spray coater parameters
1200 process baseline
AR-P 3100series posi PR
3100 properties
3100 spin curve
3100 structure&resolution
3100 process baseline
3100 data for fine tune
AR-P 3200series thick PR
3200 properties
3200 spin curve
3200 structure&resolution
3200 process baseline
3200 data for fine tune
AR-P 3500series posi PR
3500 properties
3500 spin curve
3500 structure
3500 process baseline
3500 data for fine tune
AR-P 3740 posi PR
3740 properties
3740 spin curve
3740 structure&resolution
3740 process baseline
3740 data for fine tune
AR-P 5300series posi PR
5300 properties
5300 spin curve
5300 structure&resolution
5300 process baseline
SXAR-P 3500/8 posi PR
3500/8 properties
3500/8 spin curve
3500/8 structure&resolution
3500/8 process baseline
AR-N 2200series spray PR
2200 properties
2200 spray coater parameters
2200 process baseline
AR-N 4340 CAR
4340 properties
4340 spin curve
4340 resolution&structure
4340 process baseline
4340 data for fine tune
AR-N 4400series (CAR 44)
4400 properties
4400 spin curve
4400 structure & resolution
4400 process baseline
4400 data for fine tine
4400 thick layer
4400 rival comparison
AR-N 4600 series (Atlas 46)
4600 properties
4600 spin curve
4600 resist structures
4600 process baseline
4600 data for fine tune
4600 Dyed and fluorescent films
Protective resist保護阻劑
AR-PC 500series
500 properties
500 spin curve
500 application photo
500 process baseline
SX AR-PC 5000/41
5000/41 properties
5000/41 spin curve
5000/41 application photo
5000/41 1-layer process baseline
5000/41 2-layer process baseline
Bottom resist底層阻劑
AR-BR 5400series
5400 properties
5400 spin curve
5400 structure&resolution
5400 2-layer posi-PR process
5400 2-layer nega-PR process」的複本
Process chemicals製程化學品
Developer 顯影劑
AR 300-26
AR 300-35
AR 300-44
AR 300-46
AR 300-47
AR 300-475
AR 600-50
AR 600-546
AR 600-548
AR 600-549
AR 600-55
AR 600-56
Remover 去除劑
AR 300-70
AR 300-72
AR 300-73
AR 300-76
AR 600-71
Adhesion promoter增黏劑
AR 300-80
HMDS
Thinner 稀釋劑
AR 300-12
AR 600-02
AR 600-07
AR 600-09
Stopper顯影抑制劑
AR 600-60
Equipments
ELO-Epitaxial lift-off
Contact us 聯絡我們
Contact Us
Resist Wiki
resist wiki
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