Standard Positive Photoresists AR-P 3500series
For the production of integrated circuits with wide process range
AR-P 3500series 產品說明
AR-P 3500 系列產品為標準正型光阻,敏感度高,製程穩定,適合各類積體電路製程.
產品編號:
AR-P 3510 / AR-P 3510T / AR-P 3540 / AR-P 3540T
產品包裝:
250 ml/ 瓶
1,000 ml/ 瓶
出貨: ☑️ 2 - 4 週. 徳國運出
🔲 1 週. 國內庫存
Characterization 產品特性
broadband UV, i-line, g-line
曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)
high photosensitivity, high resolution
高敏感度,高解析度
very good adhesion properties.
與基板介面接著度良好
3500 T: robust processing, suitable for TMAH developer 0.26n
AR-P 3510T/3540T製程穩定,適合四甲基氫氧化銨(TMAH 0.26n)顯影
plasma etching resistant, temperature-stable up to 120 °C
耐電漿蝕刻,耐溫可達120℃
combination of novolac and naphthoquinone diazide
主要成份為酚醛樹酯及叠氮基萘醌
safer solvent PGMEA
使用較安全溶劑丙二醇單甲醚醋酸酯