Medusa 82 UV silsesquioxane based Electron Beam Resist
High-resolution, etch-stable, negative tone, for EBL EUV & DUV, HSQ compatible
▶️ Medusa 82 (SXAR-N 8200) data 產品資料
▶️ Medusa 82 UV (SXAR-N 8250) 產品資料
▶️ Properties 產品物性
Product quick guide 產品快速導覽▶️ EBL resist 電子束微影阻劑▶️ tSPL resist 熱掃描微影阻劑▶️ Conductive coating 導電塗佈▶️ Photoresist 光阻劑▶️ Protective resist 保護塗層▶️ Bottom resist 底層阻劑▶️ Process chemicals 製程化學品