AR-P 617 Positive eBeam Lithography Resist
Resists for nanometer lithography, highest resolution, Copolymer 33% MA
▶️ AR-P 617 brief 產品概述
▶️ Product data 產品資料
▶️ Characterization 產品特性
▶️ Property I & II 產品物性
▶️ Spin curve 塗佈曲線
▶️ Process baseline 基本參數
▶️ Film thickness vs solid content
▶️ Structure & resolution 結構解析度
▶️ Under-cut (lift-off) 懸浮剝離結構
▶️ Reaction mechanism 反應機構
▶️ Planarization 平坦化特性
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📂 AR-P 617series TDS download 資料下載
📖 AR-P 617series bilingual TDS 雙語資料下載