AR-P 617 Positive eBeam Lithography Resist
Resists for nanometer lithography, highest resolution, Copolymer 33% MA
▶️ Product data 產品資料
▶️ Spin curve 塗佈曲線
▶️ Film thickness vs solid content
▶️ Structure & resolution 結構解析度
Product quick guide 產品快速導覽▶️ EBL resist 電子束微影阻劑▶️ tSPL resist 熱掃描微影阻劑▶️ Conductive coating 導電塗佈▶️ Photoresist 光阻劑▶️ Protective resist 保護塗層▶️ Bottom resist 底層阻劑▶️ Process chemicals 製程化學品