Stopper for AR Resist

For the stopping of e-beam resist film development with solvents

Stopper Product Brief 產品說明

顯影抑制劑主要用於電子束微影的顯影製程,可使顯影製程中斷.目前產品有:

AR 600-60 / AR 600-61

AR 600-60 適用於AR-P 617 series / AR-P 6200 series / AR-P 630-670 PMMA

AR 600-61適用於 AR-P 6510 EBL resist

AR stopper 產品包裝:

2.5   L /瓶

其它包裝可依客戶需求增加.

出貨: ☑️   2 - 4 週. 徳國運出

          🔲         1 週. 國內庫存

Characterization 產品特性

• immediate interruption of the development process

可立即中斷顯影製程

• ultra-pure solvent mixtures for residue-free removal of remaining developer

高純度混合溶劑,可有效的去除殘留的顯影液

• If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.

於顯影液AR 600-50 / AR 600-55 / AR 600-56中加入20%的AR 600-60抑制劑,可降

低顯影速率.