AR 300-40 series metal-ion free Developer for AR resists

For the development of photoresists and novolac-based e-beam resist films

AR 300-475 product brief 產品說明

AR 300-40系列顯影劑依濃度不同分為

AR 300-44 / AR 300-46 / AR 300-47 / AR 300-475

產品包裝:

1      L /瓶

2.5  L/瓶

其它包裝可依客戶需求增加.

出貨: ☑️   2 - 4 週. 徳國運出

            🔲         1 週. 國內庫存

Characterization 產品特性

• metal ion-free aqueous-alkaline solutions for the processing of photo/ e-beam resists.

不含金屬離子的鹼性水溶液,做為光阻黃光或電子束微影顯影劑.

• reduce the risk of metal ion contamination at the substrate surface

減少金屬離子在基板表面造成污染.

• residue-free development

顯影後無顯影液殘留.

• metal ion content < 0.1 ppm

含金屬離子<0.1ppm

• main component TMAH

主要成分為氫氧化四甲銨(TMAH)