Positive PMMA e-Beam Resist AR-P 630– 670 series
PMMA resist 50K – 950K for the production of semiconductor and masks
Positive PMMA e-Beam Resist AR-P 630– 670 series
PMMA resist 50K – 950K for the production of semiconductor and masks
Specifications of 50K, 200K, 600K and 950 K in chlorobenzene, anisole and ethyl lactate
▶️ PMMA resist data 產品資料
▶️ structure & resolution 結構與解析度
▶️ 2-layer & lift-off application 雙層與懸浮剝離
▶️ PMMA product range table 產品選擇表