Positive Photoresists AR-P 5300series for lift-off

Sensitive photoresist for the production of evaporation samples

AR-P 5300series 產品說明

AR-P 5300系列產品為高敏感度正型光阻,適合電極等金屬蒸鍍浮剝離(lift-off)製程

產品編號:  

AR-P 5320 /AR-P 5350

產品包裝: 

產品無固定生產排程,購買需先詢問   

   250 ml/瓶

1,000 ml/瓶

出貨: ☑️   4 – 8 週. 徳國運出

           🔲           1 週. 國內庫存

Characterization 產品特性

• broadband UV, i-line, g-line

曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)

• high photosensitivity, high resolution

高敏感度,高解析度

• good adhesion properties

與基板介面接著度良好

• undercut structures for the production of evaporation samples, in particular of metal using lift-off techniques e.g., for conductor paths

下切結構適合金屬電極等蒸鍍及浮剝離技術

• plasma etching resistant, temperature-stable up to 120 °C

耐電漿蝕刻,耐溫可達120℃

• combination of novolac and naphthoquinone diazide

主要成份為酚醛樹酯及叠氮基萘醌

• safer solvent PGMEA

使用較安全溶劑丙二醇單甲醚醋酸酯