AR-N 4600 series (Atlas 46) negative photoresist for high film thickness
for the application of electroplating, micro-systems and LIGA < 20 μm
Embedded Files
Resist structures
Atlas (S) (Martin Luther University Halle-Wittenberg)
Process parameters
Resist structures
Atlas (R) (Martin Luther University Halle-Wittenberg)
Process chemicals
AR-N 4600series negative CAR photoresist
▶️ resolution & structures 解析度與結構
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