AR-N 4600 series (Atlas 46) negative photoresist for high film thickness
for the application of electroplating, micro-systems and LIGA < 20 μm
AR-N 4600 series (Atlas 46) negative photoresist for high film thickness
for the application of electroplating, micro-systems and LIGA < 20 μm
AR-N 4600 series (Atlas 46) 產品說明
AR-N 4600系列為高膜厚產品,適合於電鍍,微系統,微機電等各類應用.
產品編號:
AR-N 4610 (S) – stable layer. 可做為結構的一部份
AR-N 4650 (R) – removable layer. 適合於各類金屬電鍍製程.
產品包裝:
250 ml/ /瓶
1,000 ml/ /瓶
出貨: ☑️ 2 - 4 週. 徳國運出
🔲 1 週. 國內庫存
Characterization 產品特性
i-line, broadband UV
曝光波長: 寬頻紫外線, i-line (365nm).
very good adhesion properties
黏著度良好.
very high sensitivity
高敏感度.
4600-10 for stable layers of 5 μm – 15 μm
AR-N 4600-10應用於 厚度 5 um – 15 um的永久材.
4650-10 for removable layers of 5 μm – 15 μm
AR-N 4650-10應用於厚度 5 um -15 um的可去除層.
poly[(o-cresyl glycidyl ether)-co-formaldehyde] and acid generator
成份含PCGF-聚[(鄰甲苯基縮水甘油醚)-共甲醛]與光酸.
Safer solvent PGMEA
使用較安全溶劑PGMEA