Negative thick layer photoresist AR-N 4400 series (CAR 44)
For the application of electroplating, micro-system and LIGA
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Process baseline
This diagram shows exemplary process steps for resist AR-N 4400series resist. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing ,☞ “ Detailed instructions for optimum processing of photoresists”. For recommendations on wastewater treatment and general safety instructions ☞” General product information on Allresist photoresists”.
圖示AR-N 4600系列產品製程參數的範例. 所有參數為參考值,使用者應依設備環境實際狀況加以調整
AR-N 4400series negative CAR photoresist
▶️ resolution & structures 解析度與結構
▶️ process baseline 製程參數
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