Characterization 產品特性

• broadband UV, i-line, g-line, e-beam, X-ray, synchrotron

適合各類曝光;寬頻紫外線, i-line, g-line, 電子束,x光,同步輻射

• chemically enhanced, very good adhesion, electro plating-stable

化學放大型光阻. 與基板介面接著性良好. 於電鍍製程穩定

• very high sensitivity, easy removal

光阻具高敏感度,且去除容易

• profiles with high edge steepness for excellent resolution, covering of topologies

光阻圖案側視具垂直邊緣,解析度高

• 4400-05 for film thicknesses up to 10 μm (250 rpm)

4400-05膜厚在250轉可達10um

• 4400-10 for film thicknesses up to 20 μm (250 rpm)

4400-10膜厚在250轉可達20um

• 4450-10T for film thicknesses up to 20 μm and lift-off, developing by TMAH 0.26n

4450-10T膜厚在250轉可達20um,適lift-off及TMAH (0.26n)顯影

• 4400-25 for very thick film up to 50um (250 rpm)

4400-25膜厚在250轉可達50um

• 4400-50 for highest film thickness up to 100 um 

4400-50膜厚可達100um

• novolac, crosslinking agent, amine-based acid generator

成份含酚醛樹脂,架橋劑,胺基光酸.

• safer solvent PGMEA

較安全溶劑丙二醇單甲醚醋酸酯PGMEA