AR-N 4340 產品說明

AR-N 4340 為化學放大型,高敏感度光阻,適合各類電路運用.

產品編號: AR-N 4340

產品包裝: (無固定生產排程, 需訂單生產)

   250 ml/ /瓶

1,000 ml/ /瓶

出貨: 🔲   4 - 8 週. 徳國運出

            🔲          1 週. 國內庫存

Characterization 產品特性

• i-line, g-line

曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)

• highest sensitivity, excellent resolution

高敏感度,高解析度.

• good adhesion, high contrast, chemically enhanced

化學放大型,具高對比,與基板黏著度良好.

• undercut profiles (lift-off) are possible

可調整成undercut圖案, 可用於lift-off製程. 

• plasma etching resistant

耐各類電漿蝕刻.

• temperature-stable up to 220 °C after subsequent treatment

調整適合製程可使光阻在220℃高溫維持穩定.

• novolac with photochemical acid generator and amine-based crosslinking agent

成份含酚醛樹酯,光酸與架橋劑.

• Safer solvent PGMEA

使用較安全溶劑PGMEA