Negative Electron Beam Resist AR-N 7500series

High-resolution EBL resists for mix & match in semiconductor process

產品簡介:

AR-N 7500系列, 為負型電子束微影阻劑 (negative tone EBL resist). 可以電子束及紫外光曝光

(deep UV, I line, G line), 適合於半導體混搭製程(mix & match). 產品系列目前有: