Standard Positive Photoresists AR-P 3740 for sub-um
Sensitive photoresist for the production of highly integrated circuits
AR-P 3740 產品說明
AR-P 3740 產品為高敏感度正型光阻,適合次微米高密度積體電路製程
產品編號:
AR-P 3740
產品包裝:
250 ml/瓶
1,000 ml/瓶
出貨: ☑️ 2 - 4 週. 徳國運出
🔲 1 週. 國內庫存
Standard Positive Photoresists AR-P 3740 for sub-um
Sensitive photoresist for the production of highly integrated circuits
AR-P 3740 產品說明
AR-P 3740 產品為高敏感度正型光阻,適合次微米高密度積體電路製程
產品編號:
AR-P 3740
產品包裝:
250 ml/瓶
1,000 ml/瓶
出貨: ☑️ 2 - 4 週. 徳國運出
🔲 1 週. 國內庫存
Characterization 產品特性
broadband UV, i-line, g-line
曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)
high sensitivity, highest resolution up to 0.4 μm
高敏感度,最高解析度可達0.4 um
high contrast, excellent dimensional accuracy
高對比,尺寸精確度良好
optimized coating properties on topologically complex substrate surfaces
塗佈特性適合基板表面複雜的高低結構
3840 colored to prevent the effect of standing waves
AR-P 3840染料參雜以避免駐波效應
plasma etching resistant, temperature-stable up to 120 °C
耐電漿蝕刻,耐溫可達120℃
combination of novolac and naphthoquinone diazide
主要成份為酚醛樹酯及叠氮基萘醌
safer solvent PGMEA
使用較安全溶劑丙二醇單甲醚醋酸酯