Standard Positive Photoresists AR-P 3500series

For the production of integrated circuits with wide process range

AR-P 3500series 產品說明

AR-P 3500 系列產品為標準正型光阻,敏感度高,製程穩定,適合各類積體電路製程.

產品編號:  

AR-P 3510 / AR-P 3510T / AR-P 3540 / AR-P 3540T

產品包裝:    

   250 ml/ 瓶

1,000 ml/ 瓶

出貨: ☑️   2 - 4 週. 徳國運出

           🔲          1 週. 國內庫存

Characterization 產品特性

• broadband UV, i-line, g-line

曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)

• high photosensitivity, high resolution  

高敏感度,高解析度

• very good adhesion properties.

與基板介面接著度良好

• 3500 T: robust processing, suitable for TMAH developer 0.26n

AR-P 3510T/3540T製程穩定,適合四甲基氫氧化銨(TMAH 0.26n)顯影

• plasma etching resistant, temperature-stable up to 120 °C

耐電漿蝕刻,耐溫可達120℃

• combination of novolac and naphthoquinone diazide

主要成份為酚醛樹酯及叠氮基萘醌

• safer solvent PGMEA

使用較安全溶劑丙二醇單甲醚醋酸酯