Thick Positive Photoresists AR-P 3200series
For the application of electroplating and micro-systems technology
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AR-P 3200series 產品說明
AR-P 3200 系列產品為正型厚膜光阻,適合電鍍與微機電系統製程.
產品編號:
AR-P 3210 / AR-P 3220 / AR-P 3250 / AR-P 3250T
產品包裝:
產品無固定生產週期,需事先詢問.
250 ml/ /瓶
1,000 ml/ /瓶
出貨: ☑️ 4 - 8 週. 徳國運出
🔲 1 週. 國內庫存
Characterization 產品特性
broadband UV, i-line, g-line
曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)
high photosensitivity, high resolution
高敏感度,高解析度
profiles with high edge steepness dimension accuracy.
黃光圖案尺寸精確,邊緣垂直度高
plasma etch resistant, electroplating-stable
耐電漿蝕刻. 電鍍製程穩定
AR-P 3210 film thickness up to 40um/AR-P 3250 film thicknesses up to 20 μm
AR-P 3210 膜厚最高可達 40um/AR-P 3250膜厚最高可達20um
AR-P 3220 transparent for thick films up to 100 μm in multiple coating steps, 100μm development in one step
AR-P 3220 透明膜厚經多次疊加塗佈可達100um,僅需單次顯影.
combination of novolac and naphthoquinone diazide
主要成份為酚醛樹酯及叠氮基萘醌
safer solvent PGMEA
使用較安全溶劑丙二醇單甲醚醋酸酯
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