Positive Photoresists AR-P 3100 series
Adhesion-enhanced resists for masks and fine scale application
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AR-P 3100series 產品說明
AR-P 3100 系列產品強化與基板介面的接著度,適合各類精密微影
產品編號:
AR-P 3110 / AR-P 3120 / AR-P 3170
產品包裝:
250 ml/ /瓶
1,000 ml/ /瓶
出貨: ☑️ 2 - 4 週. 徳國運出
🔲 1 週. 國內庫存
Characterization 產品特性
broadband UV, i-line, g-line
曝光波長: 寬頻紫外線, i-line (365nm) , g-line (436nm)
high photosensitivity, high resolution
高敏感度,高解析度
strong adhesion to critical glass/chromium surfaces for extreme stresses during wet-chemical etching processes
對玻璃,鉻等介面接著度良好,適合濕蝕刻製程
for the production of CD masters and lattice structures
適合CD母片及各式點陣結構
AR-P 3170 also suitable for laser interference lithography
AR-P 3170可用於雷射干涉微影
plasma etching resistant
耐電漿蝕刻
combination of novolac and naphthoquinone diazide
主要成份為酚醛樹酯及叠氮基萘醌
safer solvent PGMEA
使用較安全溶劑丙二醇單甲醚醋酸酯
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