AR-N 7720 series Negative e-Beam Resist (CAR type)
High-resolution resist with flat gradation for semiconductor process
AR-N 7720 series Negative e-Beam Resist (CAR type)
High-resolution resist with flat gradation for semiconductor process
產品簡介:
AR-N 7720系列, 為化學放大 chemically amplified (CAR)負型電子束微影阻劑 (negative tone EBL resist). 可在電子束及深紫外線曝光(deep UV), 適合於微奈米製程. 例如繞射光學(Diffractive optics),全像攝影(holograms)等. 產品系列目前有:
產品包裝:
產品目前無固定生產周期,需預定,交貨期較長.
250 ml /瓶
1 L /瓶
其它包裝可依客戶需求增加.
出貨: ☑️ 3 - 6 週. 德國運出
🔲 1 週. 國內庫存