Negative e-Beam Resist AR-N 7520-new series

High-resolution EBL resists for mix & match in semiconductor process

產品簡介:

AR-N 7520-new系列, 為負型電子束微影阻劑 (negative tone EBL resist). 可以電子束及紫外線(deep UV, I line)曝光, 適合於半導體混搭製程(mix & match). 產品系列目前有: