Positive Photoresists AR-P 3100 series

Adhesion-enhanced resists for masks and fine scale application

Process baseline

This diagram shows exemplary process steps for AR-P 3100 resists. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing, 👉“ Detailed instructions for optimum processing of photoresists”. For recommendations on wastewater treatment and general safety instructions, 👉”General product information on Allresist photoresists”.

圖示AR-P 3100系列產品製程參數的範例. 所有參數為參考值,使用者應依設備環境實際狀況加以調整