AR-N 4600 series (Atlas 46) negative photoresist for high film thickness

for the application of electroplating, micro-systems and LIGA < 20 μm

Process baseline

This diagram shows exemplary process steps for resist AR-N 4600. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing ,☞ “ Detailed instructions for optimum processing of photoresists”. For recommendations on wastewater treatment and general safety instructions ☞” General product information on Allresist photoresists”.

圖示AR-N 4600系列產品製程參數的範例. 所有參數為參考值,使用者應依設備環境實際狀況加以調整

Development recommendations