Positive E-Beam Resist AR-P 6200series (CSAR 62)

High resolution high contrast EBL resists for integrated circuit & masks

Process Instruction

High layers for special applications:

Films with a thickness of up to 800 nm can be produced With AR-P 6200.13, and even 1.5-μm films are possible with experimental sample SX AR-P 6200/10.

AR-P 6200.13厚度可達800nm. SX AR-P 6200/10 (AR-P 6200.18)厚度達1.5um

CSAR 62 is also applied in various two-layer systems and can be used both as bottom and as top resist.


Another field of application for CSAR 62 is the production of mask blanks which are coated with our resist and offered by our partners:

於空白光罩應用(mask blanks)