Positive E-Beam Resist AR-P 6200series (CSAR 62)High resolution high contrast EBL resists for integrated circuit & masks
Fluorescent films with CSAR 62 and PMMA
Fluorescent dyes can be embedded into positive-tone e- beam resists like CSAR 62 and PMMA. For this purpose, both PMMA and CSAR 62 polymers were prepared in a solvent mixture which also dissolves the fluorescent dyes to a sufficient extent. The use of different fluorescent dyes allows a defined adjustable emission in various wavelength ranges. These dyes are highly process-stable, and structuring is performed in the same manner as in corresponding standard processes with uncolored e-beam resists. By embedding dyes into CSAR 62, resist films could be generated which optionally show violet, blue, yellow, orange or red fluorescence. The intense fluorescence is retained even after tempering at 180 °C.
Due to the properties of these e-beam resists, resolutions up to the 10 - 20 nm range are possible. The main field of this application is in optical industry; these materials are e.g., required for night vision devices. Fluorescent resist films are furthermore used for applications in microscopy.
電子束微影阻劑的解析度可達10-20nm, 這方面的應用主要在光學工業,例如夜視元件. 另外也可於顯微鏡方面的應用.