AR-P 617 Positive eBeam Lithography Resist

Resists for nanometer lithography, highest resolution, Copolymer 33% MA

Process conditions

This diagram shows exemplary process steps for resists of AR-P 617series. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing, 👉 “Detailed instructions for optimum processing of e-beam resists”. For recommendations on wastewater treatment and general safety instructions, 👉 ”General product information on Allresist e-beam resists”.

圖示AR-P 617.06產品製程參數的範例. 所有參數為參考值,使用者應依設備環境實際狀況加以調整