SXAR-PC 5000/40 KOH/HF protect coating

SXAR-PC 5000/40 KOH/HF resistant protection coating

features:

• not light-sensitive > 300 nm, no yellow light required
• stable protective film for protecting the wafer backside during etching of the front up to 60 °C, e.g. with 40 % caustic potash, 50 % hydrofluoric acid, BOE
• in two-layer system structurable with AR-P 3250 or AR-N 4400-05/10
• plasma etching resistant
• high-melting modified hydrocarbons - solvent ethylbenzene
  • Product series:
    • SXAR-PC 5000/40