SXAR-P 8100.04/1 thermal-structurable resist

SXAR-P 8100.04/1

thermal-structurable resist

產品特性:

SXAR-P 8100.04/1

thermal-structurable resist

features:

    • The resist consists of polyphthalaldehyde (PPA)
    • solvent anisole
    • direct structured by thermal
    • not light sensitive, no litho room required
    • recommend storage temperature: -18℃
    • thickness range:
      • 80nm@8000rpm
      • 100nm@4000rpm
      • 200nm@1000rpm
  • Product series:
      • SXAR-P 8100.04/1