SXAR-P 5900/4 alkali stable photoresist

SXAR-P 5900/4 alkali stable photoresist

產品特性:

SXAR-P 5900/4 alkali stable photoresist

features:

  • broadband-UV, i-line, g-line
  • stable in alkaline media, layer withstands 10 minutes in 2 n sodium hydroxide
  • very good adhesion, also applicable as protective coating
  • plasma etching stable
  • combination of novolac and naphthoquinone diazide with alkali-resistant components
  • safer solvent PGMEA
  • Product series:
      • SXAR-P 5900/4