SXAR-P 3740-4 sub-um dip-coating photoresist

SXAR-P 3740/4 sub-um photoresist by dip-coating for large area substrate

產品特性:

SXAR-P 3740/4 sub-um photoresist by dip-coating for large area substrate

features:

  • Broadband UV, i-line, g-line
  • high sensitivity, highest resolution up to 0.4 µm
  • very high contrast, excellent dimensional accuracy
  • particularly well suited for dip coating of large substrates
  • plasma etching stable, thermally stable up to 120 °C
  • combination of novolac and naphthoquinone diazide
  • safer solvent PGMEA
    • Product series:
      • SXAR-P 3740/4