SXAR-P 3500-6 photoresist for holography
SXAR-P 3500/6 photoresist for holography
產品特性:
SXAR-P 3500/6 photoresist for holography
features:
- broadband, i-line, g-line
- sensitive up to a wavelength of 500 nm
- suitable for the production of holographic structures
- processing in BB-UV possible, like AR-P 3510
- plasma etching stable, thermally stable up to 120 °C
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA
- Product series:
- SXAR-P 3500/6
- Product series: