SXAR-P 3500-6 photoresist for holography

SXAR-P 3500/6 photoresist for holography

features:

• broadband, i-line, g-line
• sensitive up to a wavelength of 500 nm
• suitable for the production of holographic structures
• processing in BB-UV possible, like AR-P 3510
• plasma etching stable, thermally stable up to 120 °C
• combination of novolac and naphthoquinone diazide
• safer solvent PGMEA
  • Product series:
    • SXAR-P 3500/6