SXAR-P 3500-6 photoresist for holography

SXAR-P 3500/6 photoresist for holography

產品特性:

SXAR-P 3500/6 photoresist for holography

features:

  • broadband, i-line, g-line
  • sensitive up to a wavelength of 500 nm
  • suitable for the production of holographic structures
  • processing in BB-UV possible, like AR-P 3510
  • plasma etching stable, thermally stable up to 120 °C
  • combination of novolac and naphthoquinone diazide
  • safer solvent PGMEA
    • Product series:
      • SXAR-P 3500/6