SXAR-P 3220-7 thick thermal stable

SXAR-P 3220/7 thick thermal stable photoresist - 產品特性:

XAR-P 3220/7 thick thermal stable photoresist - features:

    • broadband, i-line, g-line
    • high photosensitivity, good resolution
    • very plasma etching stable, thermally stable up to 130 °C
    • 12 µm with single spin coating step (1000 rpm) possible
    • combination of novolac and naphthoquinone diazide
    • safer solvent PGMEA