SXAR-N 4340-7 thermal stable negative resist
SXAR-N 4340/7 thermal stable (300℃) negative photoresist
產品特性:
SXAR-N 4340/7 thermal stable (300℃) negative photoresist
features:
- i-line, g-line, deep UV (248 – 266 nm)
- highest sensitivity, high resolution
- good adhesion properties, high contrast, chemically enhanced
- undercut profiles (lift-off) possible
- may be used with AR-BR 5400 as 2-layer system
- plasma etching stable, thermostable up to 300 °C
- polyhydroxystyrene polymer, higher photosensitivity
- acid generator and aminic cross-linker
- safer solvent PGMEA
- Product series:
- SXAR-N 4340/7
- Product series: