SXAR-N 4340-7 thermal stable negative resist

SXAR-N 4340/7 thermal stable (300℃) negative photoresist

產品特性:

SXAR-N 4340/7 thermal stable (300℃) negative photoresist

features:

  • i-line, g-line, deep UV (248 – 266 nm)
  • highest sensitivity, high resolution
  • good adhesion properties, high contrast, chemically enhanced
  • undercut profiles (lift-off) possible
  • may be used with AR-BR 5400 as 2-layer system
  • plasma etching stable, thermostable up to 300 °C
  • polyhydroxystyrene polymer, higher photosensitivity
  • acid generator and aminic cross-linker
  • safer solvent PGMEA
    • Product series:
      • SXAR-N 4340/7