AR-P 5900 photoresist for HF etching
AR-P 5900 photoresist for HF/BOE etching
產品特性:
AR-P 5900 photoresist for HF/BOE etching
features:
- broadband UV, i-line, g-line
- highly enhanced adhesion, retarded diffusion of hydrofluoric acid in BOE-mixture 5 : 1 (> 1 h)
- stable against 5 % hydrofluoric acid (> 15 min)
- plasma etching resistant up to 120 °C
- combination of novolac and naphthoquinone diazide, crosslinking agent, adhesion promoter
- safer solvent PGMEA
- Product series:
- AR-P 5910
- Product series: